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Medium entropy alloy cobalt chromium nickel alloy CoCrNi metal alloy materials
What is a MEA ? MEA is medium entropy alloy shrinkage.CoCrNi alloy material is the typical medium entropy alloy material. Medium entropy alloy is a new type of alloy material, usually composed of three or four main elements, and the atomic percentage of each element varies around the equal atomic...Read more -
Why are sputtering targets often called cathode targets
In many sputtering systems, the sputtering target is the cathode target, and they are just different names for the same object from different perspectives. Sputtering is a physical vapor deposition (PVD) technology. In sputtering equipment, there are two electrodes, namely the anode and the ...Read more -
TC4 Titanium alloy materials
TC4 is a grade of titanium alloy, its main component is titanium (Ti), accounting for a relatively large, but also contains 6% aluminum (Al) and 4% vanadium (V) and a small number of other elements. This composition makes TC4 titanium alloy with high strength, low density, good corrosion resistan...Read more -
CuZnNiAl alloy sputtering target
Copper-zinc-nickel-aluminum alloy target materials are are pvd coating materials , the alloy materials composed of elements such as copper (Cu), zinc (Zn), nickel (Ni), and aluminum (Al). Copper-zinc-nickel-aluminum alloy target materials with high purity, good electrical conductivity, corrosion ...Read more -
Chromium tungsten CrW sputtering target
What is Chromium Tungsten alloy sputtering target? Chromium-tungsten alloy is an alloy made of two metals, chromium and tungsten. Its chromium content is generally between 10% and 30%, and the tungsten content is between 70% and 90%. Chromium and tungsten two kinds of metal texture is different, ...Read more -
6j22 Precision Alloy Disc Metal Alloy Materials
6J22 is a nichrome precision resistance alloy, the main components include nickel, chromium, aluminum and iron. It has high resistivity, low resistance temperature coefficient and small p-copper thermoelectric motive force, which is suitable for the production of precision resistance component...Read more -
What are the production methods of sputtering targets?
We all know the sputtering target is the raw material of the pvd coating. There are three methods in our company to manufacture the sputtering target. smelting process、powder metallurgic method and spray method.Different target production methods have their own advantages and disadvantages, whic...Read more -
Metal copper and copper alloy Introduction
People often refer to red copper, bronze, brass, white copper and imitation copper. What are they, what are their properties, what are their application? Why is the copper called the king of metals? Today, follow me and know the world of copper metal together. 1.Red copper is copper with a high ...Read more -
Brass high purity alloy sputtering target brief introduction
Here’s a brief introduction to copper-zinc alloy target material. Copper-zinc alloy, also commonly known as brass, is an alloy composed of copper and zinc. The copper-zinc alloy target material is produced through the melting and refining of high-purity copper and zinc. This type of alloy t...Read more -
Chromium Aluminum alloy target pvd coating material
Chromium Aluminum alloy sputtering target is the CrAl pvd coating material. Chrome aluminum alloy target is made of high purity chromium and aluminum metal materials that is widely used in the field of tool and mold coatings. The targets react with nitrogen gas during the deposition process...Read more -
What are the application fileds of the sputtering target ?
There are many application areas. Today i mainly introduce eight appllication fileds of sputtering target. they are dispaly coating、 Sola cell coating、 Decorative coating、Information storage and hard coating、Glass coating、 EMI coating、semiconductor coating. 1.Display coating: Display coa...Read more -
The preparation process of copper tube target
Copper tube target is made of high purity copper material after a series of processing, It is usually used in sputtering technologies. The preparation process of copper tube target includes several steps such as raw material selection, pretreatment, melting, refining, casting, heat treatment,...Read more